Abstract

In a large-scale, high-power laser facility, fused silica optics plays an irreplaceable role to transmit extremely intense lasers. However, the surface fractures, such as surface pit, crack, and scratch and laser damage site, of fused silica optics will shorten the lifetime of the optics and thus limit the output performance of the laser facility. In this work, besides experimental study, finite difference time domain (FDTD) simulation is performed to study hydrofluoric acid–based (HF-based) etching effect on the surface fractures. The effect of local surface curvature on etching rate is discussed and an explicit local-curvature-dependent etching model is proposed. Based on this model, the result from FDTD simulation qualitatively agrees very well with that of the experiment. It is demonstrated that the FDTD simulation is efficient to predict the morphological evolution of the surface fractures during etching. In addition, it is found that the surface fractures will be passivated and HF-based etching can greatly suppress the laser-damage growth of laser-induced damage to the surface site of fused silica optics.

© 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

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2017 (4)

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
[Crossref]

M. Pfiffer, P. Cormont, E. Fargin, B. Bousquet, M. Dussauze, S. Lambert, and J. Néauport, “Effects of deep wet etching in HF/HNO3 and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm,” Opt. Express 25(5), 4607–4620 (2017).
[Crossref] [PubMed]

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

2016 (3)

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

2015 (2)

P. Vivini and M. Nicolaizeau, “The LMJ: overview of recent advancements and very first experiments,” Proc. SPIE 9345, 934503 (2015).
[Crossref]

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

2014 (1)

2013 (2)

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

2012 (2)

Y. Wu, L. Jiao, H. Guo, M. Fujimoto, and K. Shimada, “Ultrafine surface finishing of fused silica glass using MCF (magnetic compound fluid) wheel,” Adv. Mat. Res. 565, 3–9 (2012).
[Crossref]

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

2011 (1)

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

2010 (1)

2009 (2)

L. L. Wong, T. I. Suratwala, M. D. Feit, P. E. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Crys. Solids 355(13), 797–810 (2009).

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

2007 (1)

G. Guss, I. Bass, R. Hackel, C. Mailhiot, and S. Demos, “High-resolution 3-D imaging of surface damage sites in fused silica with optical coherence tomography,” Proc. SPIE 6720, 67201F (2007).
[Crossref]

2006 (1)

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

2004 (2)

E. I. Moses, “National ignition facility: 1.8-MJ 750-TW ultraviolet laser,” Proc. SPIE 5341, 13–24 (2004).
[Crossref]

Y. Su, Y. H. Zhou, W. Huang, and Z. M. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chin. Cera. Soc. 32(3), 287–293 (2004).

2001 (1)

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

2000 (1)

D. M. Knotter, “Etching mechanism of vitreous silicon dioxide in HF-based solutions,” J. Am. Chem. Soc. 122(18), 4345–4351 (2000).
[Crossref]

1999 (1)

S. A. Sukharev, “High-power phosphate-glass laser system Luch: a prototype of the Iskra-6 facility module,” Proc. SPIE 3492, 12–24 (1999).
[Crossref]

1986 (1)

Bakule, P.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Balabanski, D.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Barros, R.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Base, R.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Bass, I.

G. Guss, I. Bass, R. Hackel, C. Mailhiot, and S. Demos, “High-resolution 3-D imaging of surface damage sites in fused silica with optical coherence tomography,” Proc. SPIE 6720, 67201F (2007).
[Crossref]

Batysta, F.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Bousquet, B.

Britten, J.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Bude, J. D.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Carr, C. W.

R. A. Negres, D. A. Cross, Z. M. Liao, M. J. Matthews, and C. W. Carr, “Growth model for laser-induced damage on the exit surface of fused silica under UV, ns laser irradiation,” Opt. Express 22(4), 3824–3844 (2014).
[Crossref] [PubMed]

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Cata-Danil, G.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Chen, X.

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Chen, Y. B.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Chkhalo, N. I.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Conder, A. D.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Cormont, P.

Cross, D. A.

Dai, W. J.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Dang, Z.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Demos, S.

G. Guss, I. Bass, R. Hackel, C. Mailhiot, and S. Demos, “High-resolution 3-D imaging of surface damage sites in fused silica with optical coherence tomography,” Proc. SPIE 6720, 67201F (2007).
[Crossref]

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Deng, X. W.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Dussauze, M.

Fargin, E.

Fechner, R.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Feit, M. D.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

L. L. Wong, T. I. Suratwala, M. D. Feit, P. E. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Crys. Solids 355(13), 797–810 (2009).

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Feng, B.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Fibrich, M.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Folta, J. A.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Frost, F.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Fujimoto, M.

Y. Wu, L. Jiao, H. Guo, M. Fujimoto, and K. Shimada, “Ultrafine surface finishing of fused silica glass using MCF (magnetic compound fluid) wheel,” Adv. Mat. Res. 565, 3–9 (2012).
[Crossref]

Gales, S.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Geng, F.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Green, J. T.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Gu, Z. M.

Y. Su, Y. H. Zhou, W. Huang, and Z. M. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chin. Cera. Soc. 32(3), 287–293 (2004).

Guo, H.

Y. Wu, L. Jiao, H. Guo, M. Fujimoto, and K. Shimada, “Ultrafine surface finishing of fused silica glass using MCF (magnetic compound fluid) wheel,” Adv. Mat. Res. 565, 3–9 (2012).
[Crossref]

Guo, L. F.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Guss, G.

G. Guss, I. Bass, R. Hackel, C. Mailhiot, and S. Demos, “High-resolution 3-D imaging of surface damage sites in fused silica with optical coherence tomography,” Proc. SPIE 6720, 67201F (2007).
[Crossref]

Hackel, R.

G. Guss, I. Bass, R. Hackel, C. Mailhiot, and S. Demos, “High-resolution 3-D imaging of surface damage sites in fused silica with optical coherence tomography,” Proc. SPIE 6720, 67201F (2007).
[Crossref]

Heebner, J. E.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Homer, P.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Houzvicka, J.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Hrebicek, J.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Hrubesh, L.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Hu, D. X.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Huang, J.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Huang, W.

Y. Su, Y. H. Zhou, W. Huang, and Z. M. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chin. Cera. Soc. 32(3), 287–293 (2004).

Hvlicek, T.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Ivan, C.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Jiang, X.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Jiao, L.

Y. Wu, L. Jiao, H. Guo, M. Fujimoto, and K. Shimada, “Ultrafine surface finishing of fused silica glass using MCF (magnetic compound fluid) wheel,” Adv. Mat. Res. 565, 3–9 (2012).
[Crossref]

Jing, F.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Kegelmeyer, L. M.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Knotter, D. M.

D. M. Knotter, “Etching mechanism of vitreous silicon dioxide in HF-based solutions,” J. Am. Chem. Soc. 122(18), 4345–4351 (2000).
[Crossref]

Kom, G.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Korous, P.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Koselja, M.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Koutris, E.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Kozlowski, M.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Kramer, D.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Lambert, S.

Laub, M.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Laurence, T. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Li, C.

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Li, H.

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

Li, L.

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Liao, Z. M.

Lin, D. H.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Lindsey, E.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Liu, C.

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Liu, H.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Liu, L. Q.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Liu, T.

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

Lorenz, P.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Lv, H.

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

MacGowan, B. J.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Mailhiot, C.

G. Guss, I. Bass, R. Hackel, C. Mailhiot, and S. Demos, “High-resolution 3-D imaging of surface damage sites in fused silica with optical coherence tomography,” Proc. SPIE 6720, 67201F (2007).
[Crossref]

Mason, D. C.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Matthews, M. J.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

R. A. Negres, D. A. Cross, Z. M. Liao, M. J. Matthews, and C. W. Carr, “Growth model for laser-induced damage on the exit surface of fused silica under UV, ns laser irradiation,” Opt. Express 22(4), 3824–3844 (2014).
[Crossref] [PubMed]

Mazanec, T.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Menapace, J.

Mikhailenko, M. S.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Milkov, A. V.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Miller, P. E.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

L. L. Wong, T. I. Suratwala, M. D. Feit, P. E. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Crys. Solids 355(13), 797–810 (2009).

Molander, W.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Monticelli, M. V.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Moses, E. I.

E. I. Moses, “National ignition facility: 1.8-MJ 750-TW ultraviolet laser,” Proc. SPIE 5341, 13–24 (2004).
[Crossref]

Naylon, J.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Néauport, J.

Negres, R. A.

Nicolaizeau, M.

P. Vivini and M. Nicolaizeau, “The LMJ: overview of recent advancements and very first experiments,” Proc. SPIE 9345, 934503 (2015).
[Crossref]

Norton, M.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Norton, M. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Nostrand, M. C.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Novak, J.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Novak, M.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Peng, Z. T.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Pestov, A. E.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Pfiffer, M.

Polan, J.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Polkovnikov, V. N.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Poprawe, R.

C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
[Crossref]

Qiao, L.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Ren, H.

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Rus, B.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Salashchenko, N. N.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Scheer, H.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Schmickler, A.

C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
[Crossref]

Shen, N.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Shimada, K.

Y. Wu, L. Jiao, H. Guo, M. Fujimoto, and K. Shimada, “Ultrafine surface finishing of fused silica glass using MCF (magnetic compound fluid) wheel,” Adv. Mat. Res. 565, 3–9 (2012).
[Crossref]

Spaeth, M. L.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Staggs, M.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Steele, R.

L. L. Wong, T. I. Suratwala, M. D. Feit, P. E. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Crys. Solids 355(13), 797–810 (2009).

Steele, R. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Steele, W. A.

Steinberg, C.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Strulya, I. L.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Su, J. Q.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

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Y. Su, Y. H. Zhou, W. Huang, and Z. M. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chin. Cera. Soc. 32(3), 287–293 (2004).

Sukharev, S. A.

S. A. Sukharev, “High-power phosphate-glass laser system Luch: a prototype of the Iskra-6 facility module,” Proc. SPIE 3492, 12–24 (1999).
[Crossref]

Summers, L.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Sun, L.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Suratwala, T. I.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

L. L. Wong, T. I. Suratwala, M. D. Feit, P. E. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Crys. Solids 355(13), 797–810 (2009).

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Tesileanu, O.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Thoma, J.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Thomas, I. M.

Ursescu, D.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Ursu, I.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Vitek, M.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

Vivini, P.

P. Vivini and M. Nicolaizeau, “The LMJ: overview of recent advancements and very first experiments,” Proc. SPIE 9345, 934503 (2015).
[Crossref]

Wang, F.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Wegner, P.

L. Hrubesh, M. Norton, W. Molander, P. Wegner, M. Staggs, S. Demos, J. Britten, L. Summers, E. Lindsey, and M. Kozlowski, “Chemical etch effects on laser-induced surface damage growth in fused silica,” Proc. SPIE 4347, 553–559 (2001).
[Crossref]

Wegner, P. J.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Wei, X. F.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Weingarten, C.

C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
[Crossref]

Whitman, P. K.

M. L. Spaeth, P. J. Wegner, T. I. Suratwala, M. C. Nostrand, J. D. Bude, A. D. Conder, J. A. Folta, J. E. Heebner, L. M. Kegelmeyer, B. J. MacGowan, D. C. Mason, M. J. Matthews, and P. K. Whitman, “Optics recycle loop strategy for NIF operations above UV laser-induced damage threshold,” Fus. Sci. Technol. 69(1), 265–294 (2016).
[Crossref]

Willenborg, E.

C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
[Crossref]

Wissenbach, K.

C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
[Crossref]

Wong, L. L.

T. I. Suratwala, P. E. Miller, J. D. Bude, R. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

M. D. Feit, T. I. Suratwala, L. L. Wong, W. A. Steele, P. E. Miller, and J. D. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

L. L. Wong, T. I. Suratwala, M. D. Feit, P. E. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Crys. Solids 355(13), 797–810 (2009).

Wu, W.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Wu, Y.

Y. Wu, L. Jiao, H. Guo, M. Fujimoto, and K. Shimada, “Ultrafine surface finishing of fused silica glass using MCF (magnetic compound fluid) wheel,” Adv. Mat. Res. 565, 3–9 (2012).
[Crossref]

Xiang, X.

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Xiang, Y.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Xie, X. D.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Xu, D. P.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Yan, H.

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

Yan, L.

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

Yang, K.

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

Ye, X.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Yuan, X.

T. Liu, K. Yang, H. Li, L. Yan, X. Yuan, and H. Yan, “Simulation of the evolution of fused silica’s surface defect during wet chemical etching,” Proc. SPIE 10339, 10339C (2017).

Yuan, X. D.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Zajadacz, J.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Zamfir, N. V.

D. Ursescu, O. Tesileanu, D. Balabanski, G. Cata-Danil, C. Ivan, I. Ursu, S. Gales, and N. V. Zamfir, “Extreme light infrastructure nuclear physics (ELI-NP): present status and perspectives,” Proc. SPIE 8780, 87801H (2013).
[Crossref]

Zervos, C.

B. Rus, P. Bakule, D. Kramer, G. Kom, J. T. Green, J. Novak, M. Fibrich, F. Batysta, J. Thoma, J. Naylon, T. Mazanec, M. Vitek, R. Barros, E. Koutris, J. Hrebicek, J. Polan, R. Base, P. Homer, M. Koselja, T. Hvlicek, M. Novak, C. Zervos, P. Korous, M. Laub, and J. Houzvicka, “ELI-beamlines laser systems: status and design options,” Proc. SPIE 8780, 87801T (2013).
[Crossref]

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Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Zhang, X. J.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Zhang, Y.

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Zheng, K. X.

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[Crossref]

Zheng, W.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Zheng, W. G.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Zheng, Z.

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

Zhou, H.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Zhou, W.

W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Zhou, X.

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

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W. G. Zheng, X. F. Wei, Q. H. Zhu, F. Jing, D. X. Hu, J. Q. Su, K. X. Zheng, X. D. Yuan, H. Zhou, W. J. Dai, W. Zhou, F. Wang, D. P. Xu, X. D. Xie, B. Feng, Z. T. Peng, L. F. Guo, Y. B. Chen, X. J. Zhang, L. Q. Liu, D. H. Lin, Z. Dang, Y. Xiang, and X. W. Deng, “Laser performance of the SG-III laser facility,” High Power Laser Sci. Eng. 4(3), e21 (2016).
[Crossref]

Zimmer, K.

J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

Zorina, M. V.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
[Crossref]

Zu, X.

X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
[Crossref] [PubMed]

Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
[Crossref]

X. Chen, X. Zu, W. Zheng, X. Jiang, H. Lv, H. Ren, Y. Zhang, and C. Liu, “Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films,” Wuli Xuebao 55(3), 1201–1206 (2006).

Zuev, S. Y.

N. I. Chkhalo, M. S. Mikhailenko, A. V. Milkov, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, I. L. Strulya, M. V. Zorina, and S. Y. Zuev, “Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films,” Surf. Coat. Tech. 311, 351–356 (2017).
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Y. Su, Y. H. Zhou, W. Huang, and Z. M. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chin. Cera. Soc. 32(3), 287–293 (2004).

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C. Weingarten, A. Schmickler, E. Willenborg, K. Wissenbach, and R. Poprawe, “Laser polishing and laser shape correction of optical glass,” J. Laser Appl. 29(1), 011702 (2017).
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J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H. Scheer, and K. Zimmer, “Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks,” Microelectron. Eng. 141, 289–293 (2015).
[Crossref]

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Z. Zheng, X. Zu, X. Jiang, X. Xiang, J. Huang, X. Zhou, C. Li, W. Zhang, and L. Li, “Effect of HF etching on the surface quality and laser-induced damage of fused silica,” Opt. Laser Technol. 44(4), 1039–1042 (2012).
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X. Ye, J. Huang, H. Liu, F. Geng, L. Sun, X. Jiang, W. Wu, L. Qiao, X. Zu, and W. Zheng, “Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics,” Sci. Rep. 6(1), 31111 (2016).
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Figures (24)

Fig. 1
Fig. 1 Complicated morphology of surface (A) pit, crack, scratch, and (B) laser damage sites of fused silica optics.
Fig. 2
Fig. 2 Illustration of the wet chemical etching system.
Fig. 3
Fig. 3 Meshed surface referring to a fixed reference frame.
Fig. 4
Fig. 4 A surface point P relating to its neighbor points.
Fig. 5
Fig. 5 The local etching rate vs. local surface curvature.
Fig. 6
Fig. 6 The mass removal of test sample during etching.
Fig. 7
Fig. 7 The morphological evolution of surface indented pits [26]. The subfigures have the same size scaling to the scale bar in the top-left subfigure.
Fig. 8
Fig. 8 The simulated morphological evolution of a single pit.
Fig. 9
Fig. 9 The experimental (left, optical microscopy) vs. simulated (right) morphological evolution of a surface pit array.
Fig. 10
Fig. 10 The simulated morphological evolution of arranged pits.
Fig. 11
Fig. 11 The simulated morphological evolution of randomly dispersed surface pits during etching.
Fig. 12
Fig. 12 The simulated morphological evolution of a single micron-sized crack during etching.
Fig. 13
Fig. 13 The simulated morphological evolution of randomly dispersed surface pits during etching.
Fig. 14
Fig. 14 The simulated morphological evolution of cross surface cracks.
Fig. 15
Fig. 15 The experimental (left) vs. simulated (right) morphological evolution of a single surface crack during etching [26]. The middle series is the top contour view corresponding to the right series.
Fig. 16
Fig. 16 The experimental (left) and simulated (middle and right) morphological evolution of a single surface scratch during etching.
Fig. 17
Fig. 17 The morphological evolution of a wide surface scratch during etching, experimentally characterized by optical microscopy (upper) and AFM (middle), and predicted by using FDTD simulation (lower).
Fig. 18
Fig. 18 The morphological evolution of laser damage sites during HF-based etching.
Fig. 19
Fig. 19 Laser damage growth of an unetched site (Site 1) and an etched site (Site 2) on a same optics after flat-top-shaped ultraviolet laser irradiation with the wavelength of 351 nm, the duration of 5.0 ns and the fluence of 8.0 J/cm2. The Site 2 is etched 24.0 h by using HF-based solution.
Fig. 20
Fig. 20 The comparison of laser damage growing sites of an etched optics (1#) to another unetched one (2#).
Fig. 21
Fig. 21 Laser damage growth of HF-etched laser damage sites after flat-top-shaped ultraviolet 351 nm, 5.0 ns, 8.0 J/cm2 laser irradiation. The four laser damage sites in the left subfigure are generated with different extent in damage on the surface of fused silica optics and all sites are etched 24.0 h by using HF-based solution.
Fig. 22
Fig. 22 The 3D morphological evolution of a large millimeter-sized laser-induced damage site with complicated morphology during HF-based etching.
Fig. 23
Fig. 23 The 3D morphological evolution of a sub-millimeter-sized laser-induced damage site with complicated morphology during HF-based etching.
Fig. 24
Fig. 24 A sketch of the form of laser damage site.

Equations (21)

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SiO 2 ( s o l i d ) +6HF ( a q ) SiF 6 2 - ( a q ) + 2 H ( a q ) + + 2 H 2 O ( a q ) .
[ H + ] [ F ] / [ H F ] = 6.85 × 10 4 mol/L,
[ HF 2 - ] / [HF] [ F ] = 3. 9 63 × 10 4 L/mol,
[ H 2 F 2 ] / [HF] 2 = 2.7 L/mol .
P 1 = P 0 + E r ( t 0 ) ( t 1 t 0 ) ( n ) .
x 1 = x 0 E r ( t 0 ) δ t n x ,
y 1 = y 0 E r ( t 0 ) δ t n y ,
z 1 = z 0 E r ( t 0 ) δ t n z .
n = n 1 + n 2 + n 3 + n 4 | n 1 + n 2 + n 3 + n 4 | .
n 1 = P A × P B | P A × P B | , n 2 = P B × P C | P B × P C | ;
n 3 = P C × P D | P C × P D | , n 4 = P D × P A | P D × P A | .
u = S x , v = S y ;
E = 1 + u 2 , F = u v , G = 1 + v 2 ;
L = u x 1 + u 2 + v 2 , N = v y 1 + u 2 + v 2 ;
M = v x 1 + u 2 + v 2 = u y 1 + u 2 + v 2 .
C m = E N 2 F M + G L 2 ( E G - F 2 ) .
E l c = B d E r ,
B d = A 0 + ( A 0 A 1 ) { 1 [ p 1 + 10 ( log x 1 C m ) h 1 + 1 p 1 + 10 ( log x 2 C m ) h 2 ] } .
P n e x t = P + E l c ( t ) δ t ( n ) .
S 0 = S 1 + N x N z ( X 1 X 0 ) + N y N z ( Y 1 Y 0 ) .
M r = m r r T ,

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