Abstract

A method is described of measuring the low absorption of a semireflecting film by making use of the effect of the absorption on the interference fringes obtained with the film. The method is to measure the conditions under which an etalon illuminated normally in both directions gives a uniform field of view. From a study of the sources of error in the method it is concluded that the accuracy of measurements made on multilayer dielectric films is three times that which can be expected from straightforward measurements with the same apparatus of R and T. A further threefold improvement is available if a satisfactory physical method of exploring the field of view is used in place of visual inspection.

© 1960 Optical Society of America

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