Abstract

The time variation in the internal stress of optical thin films composed of lanthanum titanium oxide (H4) deposited by ion-beam assisted deposition (IAD) and electron beam deposition was observed over a period of 10 years after deposition, and it was found that the internal stresses in the optical thin films can be controlled by optimizing the IAD conditions. Both tensile stress and compressive stress could be created by IAD, and the chemical bonding state of Ti may affect the stress behavior. The network size of the chemical bonds may affect the stress direction.

© 2016 Optical Society of America

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