Abstract

A dispersion tailoring scheme for obtaining slow light in a silicon-on-insulator W1-type photonic crystal waveguide, novel to our knowledge, is proposed in this paper. It is shown that, by simply shifting the first two rows of air holes adjacent to the waveguide to specific directions, slow light with large group- index, wideband, and low group-velocity dispersion can be realized. Defining a criterion of restricting the group-index variation within a ±0.8% range as a flattened region, we obtain the ultraflat slow light with bandwidths over 5.0, 4.0, 2.5, and 1.0nm when keeping the group index at 38.0, 48.8, 65.2, and 100.4, respectively. Numerical simulations are performed utilizing the three-dimensional (3D) plane-wave expansion method and the 3D finite-difference time-domain method.

© 2011 Optical Society of America

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