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Measuring photoelastic coefficients with Schaefer–Bergmann diffraction

Abstract

A novel technique for measuring the relative photoelastic coefficients using Schaefer–Bergmann diffraction is introduced and applied to fused silica and α-BaB2O4. The measurements of fused silica agree with the accepted values to within 0.4%, and the α-BaB2O4 measurements are verified with results presented in this paper from the established Dixon method.

© 2018 Optical Society of America

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