Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

UV light induced surface expansion phenomenon of hybrid glass thin films

Open Access Open Access

Abstract

Liquid-phase deposition of sol-gel method derived hybrid glass materials is utilized for fabrication of UV-light-sensitive thin films. The hybrid glass material undergoes a surface-relief deformation when exposed to UV light. The observed deformation phenomenon is in the form of a physical expansion of the exposed areas. The UV light induced surface expansion of the hybrid glass film was used to fabricate near-sinusoidal diffraction gratings with periods of 24 µm, 18 µm, 12 µm, and 9 µm. The maximum deformation when the material was patterned as a diffraction grating was 0.685 µm. The hybrid glass material features an index of refraction of 1.52 at 632.8 nm, rms surface roughness of 2.2±0.8 nm after processing, and extinction coefficients of 1.2×10-3 µm-1 and 0.47×10-3 µm-1 at wavelengths of 633 nm and 1550 nm, respectively.

©2001 Optical Society of America

Full Article  |  PDF Article
More Like This
Single-step fabrication of continuous surface relief micro-optical elements in hybrid sol-gel glass by laser direct writing

W. X. Yu, X. -C. Yuan, N. Q. Ngo, W. X. Que, W. C. Cheong, and V. Koudriachov
Opt. Express 10(10) 443-448 (2002)

Direct photolithographic deforming of organomodified siloxane films for micro-optics fabrication

Ari H. O. Kärkkäinen, John M. Tamkin, Jeremy D. Rogers, Daniel R. Neal, Osmo E. Hormi, Ghassan E. Jabbour, Juha T. Rantala, and Michael R. Descour
Appl. Opt. 41(19) 3988-3998 (2002)

Cited By

Optica participates in Crossref's Cited-By Linking service. Citing articles from Optica Publishing Group journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (4)

Fig. 1.
Fig. 1. Optical transmission of the UV-exposed and the unexposed thin film samples as a function of the wavelength. The discontinuity at 800 nm is an artifact associated with changing the detector in the spectrophotometer. The inset table lists extinction coefficients at eight representative wavelengths.
Fig. 2.
Fig. 2. Variation of refractive index with UV exposure dose. See text for measurement-procedure details.
Fig. 3.
Fig. 3. Surface-topography measurement of a segment of a printed diffraction grating (24 µm period, 0.685 µm peak-to-valley height).
Fig. 4.
Fig. 4. Segment of diffraction-grating surface profile (see Figure 3). The surface-profile curve is the result of averaging surface profiles over a width of 25 µm. The black line labeled “Photomask” indicates the opaque and clear areas in the photomask. The clear areas are 6 µm wide. The blue rectangles schematically indicate the illumination pattern on the hybrid glass material.

Tables (1)

Tables Icon

Table 1. Diffraction efficiencies of the 24-µm-period grating formed by 2.78 J/cm2 UV dose. The computed diffraction efficiencies correspond to phase grating with a surface topography as shown in Figure 4 and an effective index of refraction of 1.48. See text for details.

Equations (1)

Equations on this page are rendered with MathJax. Learn more.

𝓕 { exp [ 2 π i ( n 1 ) z ( x ) λ ] } 2 ,
Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved