Abstract
Liquid-phase deposition of sol-gel method derived hybrid glass materials is utilized for fabrication of UV-light-sensitive thin films. The hybrid glass material undergoes a surface-relief deformation when exposed to UV light. The observed deformation phenomenon is in the form of a physical expansion of the exposed areas. The UV light induced surface expansion of the hybrid glass film was used to fabricate near-sinusoidal diffraction gratings with periods of 24 µm, 18 µm, 12 µm, and 9 µm. The maximum deformation when the material was patterned as a diffraction grating was 0.685 µm. The hybrid glass material features an index of refraction of 1.52 at 632.8 nm, rms surface roughness of 2.2±0.8 nm after processing, and extinction coefficients of 1.2×10-3 µm-1 and 0.47×10-3 µm-1 at wavelengths of 633 nm and 1550 nm, respectively.
©2001 Optical Society of America
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