Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Investigation of the Anisotropic Stress of the Anti-reflector Multilayer Film Deposited on PET Flexible Substrate

Not Accessible

Your library or personal account may give you access

Abstract

The anti-reflection (AR) multilayer films of TiO2/SiO2 and Ta2O5/SiO2 were deposited on PET substrate with e-gun evaporation. A phase shifting moiré interferometer with Mohr’s circle method was used to measure the anisotropic residual stress.

© 2019 The Author(s)

PDF Article
More Like This
Investigation of the Anisotropic Stress and Optoelectronic Properties of MZO Film deposited on flexible substrate with RF Magnetron Sputtering

Hsi-Chao Chen, Guan-Ting Peng, Tan-Fu Liu, Ru-Fong Lai, Min-Yi Jiang, Pin-Ju Yao, Ming-Sian Yan, and Chun-Hao Chang
WC.7 Optical Interference Coatings (OIC) 2019

Finite Element Method Analyzes the Residual Stress of HfO2/SiO2 Multi-Layer on Flexible Substrate Evaporated with Ion-beam Assisted Deposition

Hsi-Chao Chen, Xin-Ya Zheng, Sheng-Bin Chen, Ming-Ying Wu, and Szu-Hui Lee
TB.7 Optical Interference Coatings (OIC) 2022

Quantitative Calculation of Substrate Bending Caused by Multilayer Thin Film Stress

Muneo Sugiura, Koichi Tamura, and Mitsunobu Kobiyama
WC.3 Optical Interference Coatings (OIC) 2019

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved