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Ultra-low Stress SiO2 Ion Beam Deposition Coatings

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Abstract

Ion beam sputtered films typically have high compressive stress. By using high energy primary ions to sputter a SiO2 target and high energy ions from an assist source with an O2 plasma the compressive stress of SiO2 can be significantly reduced down to 62MPa.

© 2019 The Author(s)

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