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Peeling prevention by SiO layer for far-infrared filter consisting of Ge/Na3AlF6

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Abstract

We found the effect of peeling prevention by SiO layer on the Na3AlF6 ultra-thick film constituting the far-infrared filter (Ge/Na3AlF6). Using this filter, the HFC gas imaging was performed with a thermal camera.

© 2019 The Author(s)

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