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Large-area Metalens Directly Patterned on a 12-inch Glass Wafer using Immersion Lithography for Mass Production

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Abstract

We developed a technology to directly process 12-inch glass wafers using 193 nm immersion lithography for metasurface devices fabrication. An 8-mm-dimeter metalens working at 940 nm wavelength has been demonstrated as a proof-of-concept functional device.

© 2020 The Author(s)

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Poster Presentation

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