Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

A 300mm CMOS-compatible PECVD silicon nitride platform for integrated photonics with low loss and low process induced phase variation

Not Accessible

Your library or personal account may give you access

Abstract

Low loss PECVD silicon nitride waveguides at 905 nm (0.2 dB/cm) and 532 nm (1.36 dB/cm) wavelengths are reported. Efficacy of phase variation measurements for identifying process conditions for optical phased array fabrication is demonstrated.

© 2019 The Author(s)

PDF Article
More Like This
Ultra-Low Loss Silicon Nitride Waveguides on Monolithic Integrated Photonics Circuits for a Mature 300 mm Wafer Scale Silicon Photonics Platform

Yukta P. Timalsina, Gerald Leake, Tat Ngai, Alin Antohe, Siti K. Binti, Christopher Baiocco, Nicholas M. Fahrenkopf, and David Harame
AM4M.7 CLEO: Applications and Technology (CLEO:A&T) 2023

Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform

Shankar Kumar Selvaraja, Peter De Heyn, Gustaf Winroth, Patrick Ong, Guy Lepage, Celine Cailler, Arnaud Rigny, Konstantin K. Bourdelle, Wim Bogaerts, Dries Van Thourhout, Joris Van Campenhout, and Philippe Absil
Th2A.33 Optical Fiber Communication Conference (OFC) 2014

Towards low-loss monolithic silicon and nitride photonic building blocks in state-of-the-art 300mm CMOS foundry

Yusheng Bian, Javier Ayala, Colleen Meagher, Bo Peng, Michal Rakowski, Ajey Jacob, Karen Nummy, Andy Stricker, Zoey Sowinski, Asli Sahin, Abdelsalam Aboketaf, Shuren Hu, Ian Stobert, Kate Mclean, Louis Medina, Kevin Dezfulian, Brendan Harris, Subramanian Krishnamurthy, Thomas Houghton, Won Suk Lee, Massimo Sorbara, Dave Riggs, Ted Letavic, Anthony Yu, Ken Giewont, and John Pellerin
FW5D.2 Frontiers in Optics (FiO) 2020

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved