The PICVD process is a preform preparation process developed by Schott.1 A silica tube, with a continuous flow of reactive gases, is placed coaxially in a hollow waveguide system. A microwave pulse is fed in at one end of the tube and propagates along the tube axis building up a plasma and initiating chemical reactions. SiO2 and dopants are deposited at the wall inside the silica tube during the microwave pulse. In the time intervals between pulses the tube is refilled with fresh gases.

© 1989 Optical Society of America

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