Abstract
The plasma-impulse-CVD (PICVD) process is especially suited for the fabrication of optical fibers with pure silica core. The plasma-enhanced reaction and deposition of gaseous layers allow a nearly 100% efficiency of SiO2 formation and the possibility of doping with high fluorine content.1,2 Thus both single-mode and multimode fibers show many advantages.
© 1988 Optical Society of America
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