Abstract

We report on a new method to improve the deposition rate of the MCVD process. Where the inside deposition thermophoresis is regarded as the particle transport mechanism,1 measures taken to raise the gradient of the radial temperature distribution result in an increase of the deposition efficiency. So far, the following have been tested: (1) cooling the substrate tube downstream from the reaction zone2; (2) plasma heating within the tube3; and (3) deposition from an annulus with heated central rod.4

© 1985 Optical Society of America

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