Fluorine-doping levels in the low-pressure PCVD process

R. Setaka; H. Takahashi; T. Sato; Susumu Yoshida

doi:10.1364/OFC.1984.TuM2

Optical Fiber Communication
1984 OSA Technical Digest Series (Optica Publishing Group, 1984),
paper TuM2
•https://doi.org/10.1364/OFC.1984.TuM2

Fluorine-doping levels in the low-pressure PCVD process

R. Setaka, H. Takahashi, T. Sato, and Susumu Yoshida

Optical Fiber Communication Conference 1984

New Orleans, Louisiana United States
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PCVD and Fiber Splicing (TuM)

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R. Setaka, H. Takahashi, T. Sato, and S. Yoshida, "Fluorine-doping levels in the low-pressure PCVD process," in Optical Fiber Communication, 1984 OSA Technical Digest Series (Optica Publishing Group, 1984), paper TuM2.

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Abstract

For radiation-resistant optical fiber links, germanium-and phosphor-free fluorine-doped cladding of high-silica fibers with high N.A. is considered most desirable. We present results of our fluorine-doping experiment in the low-pressure PCVD process showing attainment of a N.A. of ~0.3 by using different kinds of fluorine raw material. We found that C₃F₈ is the most efficient raw material for fluorine doping and CF4 is least efficient.

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