Abstract
The chemistry of the fluorine incorporation in the MCVD process has been studied using SiF4 and CCl2F2 as fluorine sources. The effluent gas composition from the process was analyzed using IR spectroscopy. The major constituents detected with the IR spectrometer were SiF4, SiF3Cl, and also CO2 when CCl2F2 was used as a fluorine source.
© 1983 Optical Society of America
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