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Fabrication of Broadband Anti-reflective Surface on Fused Silica from Visible to SWIR Spectral Band

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Abstract

A reactive-ion etching process, can be optimized to fabricate an angle of incidence independent, anti-reflective, random-structured novel material; and can be tailored to shift the nearly perfect transmissive waveband through it from Visible to SWIR.

© 2019 The Author(s)

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