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  • International Photonics and OptoElectronics Meeting 2019 (OFDA, OEDI, ISST, PE, LST, TSA)
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper LTh4C.2
  • https://doi.org/10.1364/LST.2019.LTh4C.2

Mask-free formation of ultrahigh sensitive SiC-based strain sensor arrays on elastomer toward electronic skins

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Abstract

Mask-free formation of patterned active materials on elastomers without involving complicate processes is a grand challenge in developing E-skins. Here, a laser direct writing technique is developed to fabricate SiC-based strain sensor arrays for E-skins.

© 2019 The Author(s)

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