Numerical study of laser-produced plasma extreme ultraviolet light emission using dual-pulse scheme

Po-Yen Lai; Kao-Sheng Jao; Rong-Tz Wei; Chia-Ying Hsieh; Shih-Hung Chen

doi:10.1364/EUVXRAY.2018.JT5A.6

High-Brightness Sources and Light-driven Interactions
OSA Technical Digest (online) (Optica Publishing Group, 2018),
paper JT5A.6
•https://doi.org/10.1364/EUVXRAY.2018.JT5A.6

Numerical study of laser-produced plasma extreme ultraviolet light emission using dual-pulse scheme

Po-Yen Lai, Kao-Sheng Jao, Rong-Tz Wei, Chia-Ying Hsieh, and Shih-Hung Chen

High Intensity Lasers and High Field Phenomena 2018

Strasbourg France
26–28 March 2018
ISBN: 978-1-943580-40-8

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P. Lai, K. Jao, R. Wei, C. Hsieh, and S. Chen, "Numerical study of laser-produced plasma extreme ultraviolet light emission using dual-pulse scheme," in High-Brightness Sources and Light-driven Interactions, OSA Technical Digest (online) (Optica Publishing Group, 2018), paper JT5A.6.

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Abstract

We numerically demonstrated effects of pre-pulse properties on extreme ultraviolet emission from laser-produced Sn plasmas using a dual-pulse scheme, which increases the EUV conversion efficiency from 3.6% with the single-pulse scheme to 5.9%.

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