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Conferences > FiO > 2019 > JW4A > JW4A.123

Atomic Layer Deposition of Titanium Nitride for Robust Plasmonic Color Security Devices

Dhruv Fomra, Kai Ding, Vitaliy Avrutin, Ümit Özgür, and Nathaniel Kinsey

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Abstract

Patterned titanium nitride films grown via PE-ALD exhibit plasmonic colors along with being scratch resistant and durable making them an attractive choice for applications that require robust materials such as security holograms and labels.

© 2019 The Author(s)

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