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Simulation of Multiple-Optical-Axis Pattern-Integrated Interference Lithography (PIIL) Systems

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Abstract

Exposure patterns for an optimized multiple-optical-axis PIIL system are simulated using a combination of ray tracing and Fourier analysis for several lens tilt configurations. Reasonable fidelity is shown to be possible for tilts up to 40 deg.

© 2014 Optical Society of America

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