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Pattern-Integrated Interference Lithography for 2D and 3D Photonic Crystals

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Abstract

Pattern-Integrated Interference Lithography (PIIL) couples interference lithography and imaging lithography to produce periodic microstructures with integrated functional elements in a single-exposure step. In this work, 2D-PIIL is reviewed and 3D-PIIL is simulated.

© 2013 Optical Society of America

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More Like This
Simulation of Photonic-Crystal Devices Fabricated via Pattern-Integrated Interference Lithography

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