Polarization in Hyper-NA Lithography

Bruce W. Smith

doi:10.1364/FIO.2008.SWB1

Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper SWB1
•https://doi.org/10.1364/FIO.2008.SWB1

Polarization in Hyper-NA Lithography

Bruce W. Smith

Frontiers in Optics 2008

Rochester, New York United States
19–23 October 2008
ISBN: 978-1-55752-861-2

From the session
Polarized Light: 200 Years since Malus' Discovery II (SWB)

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B. W. Smith, "Polarization in Hyper-NA Lithography," in Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper SWB1.

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Abstract

Hyper-NA immersion lithography is becoming the dominant technology for semiconductor device fabrication. At the corresponding large angles in the image media, control of polarization becomes necessary. Innovative approaches to polarization control are evolving to provide maximum enhancement from polarization effects.

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