Abstract
Multi-beam-interference lithography can be contrast-optimized to provide an efficient means of fabricating photonic crystal structures. Comparison to light- and dark-field mask technology in conventional lithography is presented and experimentally verified.
© 2008 Optical Society of America
PDF ArticleMore Like This
Justin L. Stay and Thomas K. Gaylord
FTuX5 Frontiers in Optics (FiO) 2009
Justin L. Stay and Thomas K. Gaylord
FThC5 Frontiers in Optics (FiO) 2006
Yinbing Bai and A. Ping Zhang
799006 Asia Communications and Photonics Conference and Exhibition (ACP) 2010