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  • Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper JSuA5
  • https://doi.org/10.1364/FIO.2008.JSuA5

Contrast in Multi-Beam-Interference Lithography for the Fabrication of Photonic Crystal Structures

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Abstract

Multi-beam-interference lithography can be contrast-optimized to provide an efficient means of fabricating photonic crystal structures. Comparison to light- and dark-field mask technology in conventional lithography is presented and experimentally verified.

© 2008 Optical Society of America

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