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  • Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper FTuE3
  • https://doi.org/10.1364/FIO.2007.FTuE3

Precision Motion and Control for Scanning Beam Interference Lithography

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Abstract

Precision motion and control is crucial in patterning nanometer-scale diffraction gratings over large optical substrates with sub-wave errors using scanning beam interference lithography. Innovative design and integration of commercial technologies can meet the strict requirements.

© 2007 Optical Society of America

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