Non-Planar Photolithography using Digital Holograms

Richard McWilliam; Simon Johnson; Andrew Maiden; Alan Purvis; N. Luke Seed; Gavin L. Williams; Peter A. Ivey

doi:10.1364/FIO.2006.FWX6

Frontiers in Optics
OSA Technical Digest (CD) (Optica Publishing Group, 2006),
paper FWX6
•https://doi.org/10.1364/FIO.2006.FWX6

Non-Planar Photolithography using Digital Holograms

Richard McWilliam, Simon Johnson, Andrew Maiden, Alan Purvis, N. Luke Seed, Gavin L. Williams, and Peter A. Ivey

Frontiers in Optics 2006

Rochester, New York United States
10–13 October 2006
ISBN: 1-55752-818-7

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General Optical Design and Instrumentation III (FWX)

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R. McWilliam, S. Johnson, A. Maiden, A. Purvis, N. L. Seed, G. L. Williams, and P. A. Ivey, "Non-Planar Photolithography using Digital Holograms," in Frontiers in Optics, OSA Technical Digest (CD) (Optica Publishing Group, 2006), paper FWX6.

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Abstract

A photolithographic process using digital holograms enables the fine-pitch patterning of grossly non-planar substrates, with many potential applications in microelectronics packaging. Considerations of hologram design, fabrication and verification particular to the lithographic process are presented.

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