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Photo-Mask for Wafer-Scale Fabrication of Two- and Three-Dimensional Photonic Crystal Structures

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Abstract

A methodology is presented for the batch fabrication of photonic crystal device structures across an entire wafer based on a Multi-Beam Interference Lithography (MBIL) photo-mask. The mask produces a pre-designed set of beams at various locations across a wafer to expose and record the desired two- and three-dimensional interference patterns.

© 2006 Optical Society of America

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