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Conferences > FiO > 2005 > JWA > JWA9

Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics

Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi

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Abstract

We have developed two types of stitching interferometry for surface testing of elliptical mirrors to enable hard X-ray nanofocusing. By combining the two types, elliptical surface profiles can be measured with nanometer-order accuracy.

© 2005 Optical Society of America

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