Field-varying aberration recovery in EUV microscopy using mask roughness

Gautam Gunjala; Antoine Wojdyla; Antoine Wojdyla; Aamod Shanker; Aamod Shanker; Stuart Sherwin; Markus P. Benk; Kenneth A. Goldberg; Patrick P. Naulleau; Laura Waller

doi:10.1364/COSI.2018.CW2E.2

Imaging and Applied Optics 2018 (3D, AO, AIO, COSI, DH, IS, LACSEA, LS&C, MATH, pcAOP)
OSA Technical Digest (Optica Publishing Group, 2018),
paper CW2E.2
•https://doi.org/10.1364/COSI.2018.CW2E.2

Field-varying aberration recovery in EUV microscopy using mask roughness

Gautam Gunjala, Antoine Wojdyla, Aamod Shanker, Stuart Sherwin, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, and Laura Waller

Computational Optical Sensing and Imaging 2018

Orlando, Florida United States
25–28 June 2018
ISBN: 978-1-943580-44-6

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Computational microscopy (CW2E)

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G. Gunjala, A. Wojdyla, A. Shanker, S. Sherwin, M. P. Benk, K. A. Goldberg, P. P. Naulleau, and L. Waller, "Field-varying aberration recovery in EUV microscopy using mask roughness," in Imaging and Applied Optics 2018 (3D, AO, AIO, COSI, DH, IS, LACSEA, LS&C, MATH, pcAOP), OSA Technical Digest (Optica Publishing Group, 2018), paper CW2E.2.

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Abstract

We derive and solve a simplified, self-calibrated inverse problem to characterize the field-dependent aberrations of an EUV synchrotron-based full-field microscope, using images of the surface roughness of an EUV photomask under several angles of illumination. We demonstrate diffraction-limited imaging performance at the center of its field-of-view.

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