High-power narrow-linewidth KrF laser

M. Nishio; N. Nishida; T. Kakuno; K. Kakizaki

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1991),
paper CThA3

High-power narrow-linewidth KrF laser

M. Nishio, N. Nishida, T. Kakuno, and K. Kakizaki

Conference on Lasers and Electro-Optics 1991

Baltimore, Maryland United States
12–17 May 1991
ISBN: 1-55752-189-1

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Rare Gas Fluoride Lasers (CThA)

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M. Nishio, N. Nishida, T. Kakuno, and K. Kakizaki, "High-power narrow-linewidth KrF laser," in Conference on Lasers and Electro-Optics, J. Bufton, A. Glass, T. Hsu, and W. Krupke, eds., Vol. 10 of OSA Technical Digest (Optica Publishing Group, 1991), paper CThA3.

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Abstract

Rapid progress is being made in deep ultraviolet microprocessing using a narrowband (<3 pm) KrF excimer laser as a light source.¹There are a few commercial narrowband KrF lasers, but their output powers are less than 5 W, which is not enough use in applications.

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