The e-beam excited atomic xenon laser operates in the near IR on transitions ranging from 1.73 to 3.65 μm. The laser is operated in gas mixtures consisting of less than a few percent of xenon in rare gas buffers at pressures of 0.5-10 atm. The highest efficiencies have been obtained in Ar-Xe mixtures. We report on an investigation of short pulse high power and low power high energy loading of the atomic xenon laser. Results from a model for the Xe laser1 are compared to experiments to derive scaling laws for these pumping schemes. Experiments on high power deposition (1-10 MW/cm3 atm) pumping of Ar-Xe mixtures were performed using a short pulse (30-ns) coaxial electron beam.2 High energy deposition (<1 kJ/liter atm) was obtained using a long pulse (1-ms) λ type e-beam source at power depositions of <1 kW / cm3 atm.3,4

© 1990 Optical Society of America

PDF Article


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription