Abstract

Nonlinear interferometry and beam profile distortion measurements have been commonly used to study nonlinear refraction in many materials. Interferometry is potentially sensitive but requires a relatively complex experimental apparatus. Beam distortion measurements, on the other hand, require precise beam scans followed by detailed wave propagation analysis. We present a novel method which offers simplicity as well as very high sensitivity in measuring and analyzing such nonlinearities.

© 1989 Optical Society of America

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