Abstract

In the etching of fused silica (SiO2) using a cw CO2 laser, visible plasmas are always generated whenever removal is measurable. The emission sources include the plasma plume, the hot spot on the sample, and a plasma image reflected by the etched surface. Utilizing a diaphragm in an intermediate image plane of the light collecting system, we measured spectra for different portions of the combined emission sources.

© 1989 Optical Society of America

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