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Gas contaminants produced in electron-beam-pumped XeF lasers

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Abstract

Multiple-shot operation of electron-beam (e-beam)-pumped excimer lasers tends to be limited by the production of e-beam-generated gas contaminants which degrade the laser performance. We report here the identification of the major gas contaminants produced in an e-beam-pumped XeF laser. The production rate per shot of the contaminants and the laser performance sensitivity on the concentration of the contaminants are also presented.

© 1986 Optical Society of America

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