Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Experimental comparison of electron-beam-pumped XeF laser performance using Ne and Ar diluents

Not Accessible

Your library or personal account may give you access

Abstract

In electron-beam (e-beam) pumped XeF lasers, typically Ne is used as the buffer gas at pressures of 3–4 atm, and either F2 or NF3 is used as the halogen donor. In the work reported here, Ar is used instead as the buffer gas, and the resultant laser performance is compared to the Ne diluent case. There are two reasons for testing Ar: First, Ar has a higher electron stopping power than Ne, which means for the same power deposition an Ar diluent mixture can be operated at a lower pressure than a Ne diluent mixture. The lower pressure reduces the loading on large-aperture optics and foils which eases their design constraints thereby reducing their cost. Second, the lower pressure Ar diluent mixture also has a lower heat capacity than the Ne diluent mixture. As will be shown, significant heating of the gas during the pump pulse appears to be occurring which may improve the laser performance for long-pulse (≥1-MS) operation.

© 1986 Optical Society of America

PDF Article
More Like This
High efficiency operation of the XeF(B→X) laser using a tow pressure and room temperature Ar/Xe/F2 mixture pumped by a short pulse electron beam

TOSHIAKI TAKASHIMA, FUMIHIKO KANNARI, and MINORU OBARA
THC4 Conference on Lasers and Electro-Optics (CLEO:S&I) 1989

Gas contaminants produced in electron-beam-pumped XeF lasers

Wayne D. Kimura, S. E. Moody, and J. F. Seamans
TUR4 Conference on Lasers and Electro-Optics (CLEO:S&I) 1986

KINETIC STUDY OF THE TWO COMPONENT HALOGEN DONOR MIXTURE IN DISCHARGE PUMPED XeF(B→X) LASERS

Hiroshi Kumagai, Masayuki Kakehata, Tatsuya Uematsu, Reiko Shimizu, and Minora Obara
MP9 International Quantum Electronics Conference (IQEC) 1988

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved