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Laser studies of reactive gases and the mechanisms of laser-induced CVD

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Abstract

A number of laser-induced thin-film deposition processes are based on the photochemical generation of reactive gas phase species. These species (radicals, atoms, ions, etc.) serve as precursors in a chemical sequence which ultimately results in formation of a thin film. Specific examples include the CO2 laser or UV excimer laser-induced deposition of materials, such as amorphous hydrogenated silicon, silicon nitride, and silicon dioxide. To begin to propose realistic models for film growth in such systems, it is essential to know the primary dissociation or reaction processes which take place when the source gases are irradiated and the nature and rates of any subsequent gas phase reactions which occur. It is these processes which determine the reactive chemical species which reach the substrate.

© 1986 Optical Society of America

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