Abstract
A laser scanning microscope has been developed which permits in-process inspection of patterned semiconductor wafers. In addition to its ability to produce images similar to those obtained using conventional microscopes, tine laser microscope can produce an image of the particulates contaminating the semiconductor surface without imaging the pattern itself. These separate images (in video format) can be combined through addition and subtraction to produce other useful images.
© 1982 Optical Society of America
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