Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

In situ laser spectroscopic detection of species related to CVD and plasma etching of III–V compound semiconductors

Not Accessible

Your library or personal account may give you access

Abstract

Chemical vapor deposition (CVD) techniques are used throughout the semiconductor industry to fabricate multiple-layer device structures. For example, in the expitaxial deposition of InP,1 indium is transported in the form of InCI [formed in the high temperature reaction of ln(I) with HCI], while phosphorus impinges on the substrate surface as a mixture of PH3, P2, and P4 (formed in the pyrolysis of PH3).

© 1982 Optical Society of America

PDF Article
More Like This
Laser diagnostic studies of CVD systems

W. Breiland, M. Coltrin, and P. Hargis
WK1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1982

Laser stimulation and probing of gas phase processing for microelectronics

Vincent M. Donnelly
WD2 OSA Annual Meeting (FIO) 1986

III-V Compound Semiconductor Nanowires for Optoelectronic Applications

Chennupati Jagadish
JSa1A.2 Advanced Optoelectronics for Energy and Environment (AOEE) 2013

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved