Laser diagnostic studies of CVD systems

W. Breiland; M. Coltrin; P. Hargis

doi:10.1364/CLEO.1982.WK1

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1982),
paper WK1
•https://doi.org/10.1364/CLEO.1982.WK1

Laser diagnostic studies of CVD systems

W. Breiland, M. Coltrin, and P. Hargis

Conference on Lasers and Electro-Optics 1982

Phoenix, Arizona United States
14–16 April 1982
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Semiconductor Processing Diagnostics (WK)

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W. Breiland, M. Coltrin, and P. Hargis, "Laser diagnostic studies of CVD systems," in Conference on Lasers and Electro-Optics, R. Abrams and A. Guenther, eds., OSA Technical Digest (Optica Publishing Group, 1982), paper WK1.

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Abstract

Chemical vapor deposition (CVD) is a widely used process for producing thin films for microelectronics and making coatings. Despite its development to a highly successful technical art, little is known about the basic chemistry and physics of the deposition process. We have applied a number of laser-based techniques to investigate the CVD process.

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